作者单位
摘要
1 中国科学院上海高等研究院, 上海 201204
2 中国科学院上海应用物理研究所, 上海 201800
3 清华大学工程物理系, 北京 100084
X射线自由电子激光试验装置(以下简称“SXFEL试验装置”)是中国第一台X射线相干光源,其输出波长小于9 nm。这台基于0.84 GeV 直线加速器、以掌握装置相关技术和实验演示种子型自由电子激光(FEL)级联与短波长回声型FEL为主要目标的自由电子激光装置,于2020年11月通过国家验收。本文将介绍SXFEL试验装置的基本情况和主要进展。
激光光学 X射线 自由电子激光 直线加速器 
光学学报
2021, 41(1): 0114006
Lei Zhang 1,2Lin Wang 1,2Yanqing Wu 1,3,*Renzhong Tai 1,3,**
Author Affiliations
Abstract
1 Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
3 Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China
In a single nanoscale device, surface plasmon polaritons (SPPs) have potential to match the different length scales associated with photonics and electronics. In this Letter, we propose an accurate design of a plasmonic metasurface Luneburg lens (PMLL) accommodating SPPs. The simulations indicate that the full width at half-maximum is 0.42 μm, and the focus efficiency is 78%. The characters of a PMLL have robustness to manufacturing errors. The PMLL is applied in a 10 μm long compact coupler model, which couples the SPPs to the 40 nm wide output waveguide. The couple efficiency is higher than that of a conventional taper coupler in a broad bandwidth. The design is compatible with standard lithography technology.
Luneburg nano-coupler plasmonics 
Chinese Optics Letters
2020, 18(9): 092401
Author Affiliations
Abstract
1 Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, CAS, Shanghai, People’s Republic of China
2 Shanghai Institute of Applied Physical, CAS, Shanghai, People’s Republic of China
This paper introduces the recent progress in methodologies and their related applications based on the soft x-ray interference lithography beamline in the Shanghai synchrotron radiation facility. Dual-beam, multibeam interference lithography and Talbot lithography have been adopted as basic methods in the beamline. To improve the experimental performance, a precise real-time vibration evaluation system has been established; and the lithography stability has been greatly improved. In order to meet the demands for higher resolution and practical application, novel experimental methods have been developed, such as high-order diffraction interference exposure, high-aspect-ratio and large-area stitching exposure, and parallel direct writing achromatic Talbot lithography. As of now, a 25 nm half-pitch pattern has been obtained; and a cm2 exposure area has been achieved in practical samples. The above methods have been applied to extreme ultraviolet photoresist evaluation, photonic crystal and surface plasmonic effect research, and so on.
soft x-ray EUV interference lithography 
International Journal of Extreme Manufacturing
2020, 2(1): 012005
Huijuan Xia 1,2†Yanqing Wu 1,3,4,*†Lei Zhang 1,2†Yuanhe Sun 1,2†[ ... ]Renzhong Tai 1,3,5,*†
Author Affiliations
Abstract
1 Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
3 Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China
4 e-mail: wuyanqing@zjlab.org.cn
5 e-mail: tairenzhong@zjlab.org.cn
High-resolution lens-coupled indirect X-ray scintillator imagers are required by many imaging applications. However, the severe weakening of image details prevents its further performance improvement. Through our research, this image degradation is attributed to the broadband loss of the high-spatial-frequency information caused by the high refractive index. A technique known as high-spatial-frequency spectrum enhanced reconstruction is thus proposed to retrieve this information. A two-dimensional high-density array is covered on the scintillator’s exit surface and operates as an encoder based on which high-frequency information can be shifted to the low-frequency region to improve the signal-to-noise ratio. The experimental results show that the middle-high-frequency signal intensities can be increased by an order of magnitude or more, up to 50 times. Therefore, the image details can be effectively enhanced to break through the performance bottleneck of such widely used X-ray imagers for synchrotron radiation facilities or tabletop X-ray tubes.
Photonics Research
2020, 8(7): 07001079
Huijuan Xia 1,2Shumin Yang 1,3,*Liansheng Wang 1,3Jun Zhao 1,3[ ... ]Renzhong Tai 1,3,***
Author Affiliations
Abstract
1 Shanghai Institute of Applied Physics, Shanghai 201800, China
2 University of Chinese Academy of Sciences, Beijing 100049, China
3 Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Shanghai 201204, China
Achromatic Talbot lithography (ATL) with high resolution has been demonstrated to be an excellent technique for large area periodic nano-fabrication. In this work, the uniformity of pattern distribution in ATL was studied in detail. Two ATL transmission masks with ~50% duty cycle in a square lattice were illuminated by a spatial coherent broadband extreme ultraviolet beam with a relative bandwidth of 2.38%. Nonuniform dot size distribution was observed by experiments and finite-difference time-domain simulations. The sum of the two kinds of diffraction patterns, with different lattice directions (45° rotated) and different intensity distributions, results in the final nonuniform pattern distribution.
220.3740 Lithography 220.4241 Nanostructure fabrication 
Chinese Optics Letters
2019, 17(6): 062201
作者单位
摘要
火箭军工程大学控制工程系,陕西西安, 710025
飞行器红外成像的关键技术是将接收的红外辐射能量转换为可见的灰度图像。基于飞行器红外辐射特性和红外传感器的成像原理,提出了一种利用射线跟踪(Ray tracing)结合反向蒙特卡洛法(RMC)的飞行器目标红外辐射图像生成技术的实现方法。首先利用三维建模软件建立飞行器的几何模型,并利用商业软件 ICEM对模型进行网格划分,然后基于流体力学基本守恒定律 ——N-S方程组的基本原理,利用 Fluent软件对飞行器外流场进行数值模拟,获得飞行器的温度场分布,最后利用反向蒙特卡洛法对射线的辐射传递过程进行概率模拟计算,利用 MODTRAN进行了大气传输衰减的透过率计算,利用射线跟踪技术获得了飞行器的红外辐射图像。
红外辐射图像 N-S方程组 数值模拟 射线跟踪 反向蒙特卡洛法 infrared radiation image N-S equations numerical simulation ray tracing reverse Monte Carlo method 
红外技术
2018, 40(12): 1155
作者单位
摘要
1 火箭军工程大学 测控工程系, 陕西 西安 710025
2 西安航天动力测控技术研究所, 陕西 西安 710025
以某型战斗机为研究对象, 通过三维建模与网格划分过程建立飞机的流场计算模型, 基于商用CFD软件ANSYS Fluent 16.0 对飞机的外流场特性进行数值模拟。计算中利用太阳射线追踪算法综合考虑了太阳辐射对机身温度场的影响, 采用离散坐标法(DO辐射模型)对辐射传输方程进行耦合迭代计算, 利用不带化学反应的组分输运模型(Species Transport Model)模拟燃烧后高温尾焰喷射过程, 获得了飞机外流场的温度、浓度及尾流组分分布数据。简要分析了太阳辐射对温度场变化的影响, 飞行马赫数对流场红外辐射的影响以及尾焰流场分布情况。分析表明: 太阳辐射对蒙皮加热较小, 最高升温效果仅为5 K左右, 随马赫数的增加飞行器机身背部与腹部红外辐射强度差异明显, 最高时腹部辐射强度为机身最大辐射强度2倍左右, 激波作用下尾焰后方会出现最高450 K和580 K两个间断的核心高温区域, 尾焰红外辐射强度分布符合梨形特征分布趋势。
红外辐射 流场数值模拟 离散坐标法 组分输运 梨形分布 infrared radiation numerical simulation of flow field discrete ordinate method species transport pear shape distribution 
红外与激光工程
2018, 47(7): 0704001
作者单位
摘要
火箭军工程大学测控工程系, 陕西 西安 710025
建立飞机几何模型进行非结构化网格处理, 基于 Fluent软件对飞机在外流场作用下的气动热进行了数值模拟计算, 综合考虑尾喷管、尾焰辐射对飞机机身温度的影响, 获得飞机表面的温度分布数据, 然后基于反向蒙特卡洛法建立飞机机身红外辐射特性计算模型, 利用辐射传输方程计算尾焰红外辐照度, 通过灰度转换获得飞机的红外图像。
红外辐射特性 非结构化网格 反向蒙特卡洛法 灰度转换 Fluent Fluent unstructured grid reverse Monte Carlo method gray level transformation 
红外技术
2017, 39(6): 548
作者单位
摘要
中国科学院上海应用物理研究所,上海 201800
基于统计光学理论,建立了适用于同步辐射软X射线的部分相干光的传播模型。利用互强度描述部分相干光,并采取分割波前叠加的方法,引入合理的近似,可以定量分析部分相干光传播一定距离后相干性能的变化。利用该模型分析了传播距离、光源相干长度、光源尺寸等因素对相干性能的影响。另外在上海光源软X射线干涉光刻分支线站BL08U1B进行了相干衍射实验,并利用该模型对实验结果进行了模拟。模拟结果表明,该模型能够准确地模拟BL08U1B的相干衍射图样,计算结果和实验数据符合较好,为设计同步辐射高相干性光束线站提供了理论依据和参考。
X射线光学 部分相干光 互强度 相干长度 
光学学报
2013, 33(7): 0734001
作者单位
摘要
中国科学院上海应用物理研究所, 上海 201204
扫描透射X射线显微术(STXM)是近年发展起来的基于第三代同步辐射光源的新型谱学显微技术。上海光源已在覆盖大多数重要元素吸收边的250~2000 eV光子能量段实现了STXM技术。基于上海光源STXM实验站装置模拟了一种新的成像方法:在充分利用原有装置基础上发展扫描相干衍射成像技术,不但可以有效提升实验站的空间分辨能力,而且实现起来也相对简单。针对上海光源软X射线实验站特点,讨论了实现扫描相干衍射成像的相干性条件,实验站各因素对成像分辨率的影响等,并针对具体的实验条件进行了模拟分析。模拟显示,通过发展该项技术可有效提高特定样品的空间分辨能力。
X射线光学 空间分辨率 重叠关联迭代引擎算法 扫描透射X射线显微术装置 
光学学报
2011, 31(4): 0418001

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